SOURCE CONTAINER AND VAPOUR-DEPOSITION REACTOR

摘要

A source container and a vapour-deposition reactor. The source container includes a container including inner walls for defining a first space for accommodating a source material SM and a second space adjacent to the first space, wherein carrier gas introduced thereinto and vapour generated from the source material are mixed; a carrier gas introducing path communicating inside and outside of the container and including an introduction port exposed in the second space; a mixed gas discharging path communicating inside and outside of the container and including a discharging port exposed inside in the second space; and a flow restricting member expanding in the second space and providing a first flow barrier surface between the introduction port and the discharging port.