发明名称 圧接型半導体装置及びその製造方法
摘要 <p>A pressed-contact type semiconductor device comprises: a power semiconductor element (21), on an upper surface of which at least a first electrode (26, 27) is formed and on a lower surface of which at least a second electrode (25) is formed; lead frames (8, 9, 10) which face the first electrode and the second electrode of the power semiconductor element respectively; and a clip (28) which applies a pressure to the lead frames while the power semiconductor element is sandwiched by the lead frames, wherein a metallic porous plating part (22, 23, 24) is formed on a surface which faces the first electrode or the second electrode, the surface being a surface of at least one of the lead frames.</p>
申请公布号 JP5662565(B2) 申请公布日期 2015.02.04
申请号 JP20130512044 申请日期 2012.10.19
申请人 发明人
分类号 H01L23/48;H01L21/52 主分类号 H01L23/48
代理机构 代理人
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