发明名称 Positioning device, lithographic apparatus, positioning method and device manufacturing method
摘要 A positioning device for positioning an object within a lithographic apparatus, including a support structure for supporting the object, at least two short-stroke units, each connected to the support structure, and a long-stroke unit. In the arrangement, each of the short-stroke units includes a short-stroke actuator system configured to provide independently at least one actuation force between the short-stroke unit and the long-stroke unit, and the long-stroke unit includes a long-stroke actuator system configured to provide at least one actuation force between the long-stroke unit and a reference structure of the lithographic apparatus.
申请公布号 US8947640(B2) 申请公布日期 2015.02.03
申请号 US201213494703 申请日期 2012.06.12
申请人 ASML Netherlands B.V. 发明人 Lafarre Raymond Wilhelmus Louis;Cox Henrikus Herman Marie;De Groot Antonius Franciscus Johannes;Vermeulen Johannes Petrus Martinus Bernardus
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. A positioning device for positioning an object within a lithographic apparatus, the positioning device comprising: a support structure configured to support the object; at least two short-stroke units, each having a connection section connected to the support structure at a respective connection point; and a long-stroke unit; wherein each of the short-stroke units comprises a short-stroke actuator system configured to cooperate with a same surface of the long-stroke unit to provide independently an actuation force between the connection section of the short-stroke unit and the long-stroke unit so that a position of a first of the at least two short-stroke units is independently controlled relative to a position of a second of the at least two short-stroke units; and wherein the long-stroke unit comprises a long-stroke actuator system configured to provide an actuation force between the long-stroke unit and a reference structure of the lithographic apparatus.
地址 Veldhoven NL
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