发明名称 |
Positioning device, lithographic apparatus, positioning method and device manufacturing method |
摘要 |
A positioning device for positioning an object within a lithographic apparatus, including a support structure for supporting the object, at least two short-stroke units, each connected to the support structure, and a long-stroke unit. In the arrangement, each of the short-stroke units includes a short-stroke actuator system configured to provide independently at least one actuation force between the short-stroke unit and the long-stroke unit, and the long-stroke unit includes a long-stroke actuator system configured to provide at least one actuation force between the long-stroke unit and a reference structure of the lithographic apparatus. |
申请公布号 |
US8947640(B2) |
申请公布日期 |
2015.02.03 |
申请号 |
US201213494703 |
申请日期 |
2012.06.12 |
申请人 |
ASML Netherlands B.V. |
发明人 |
Lafarre Raymond Wilhelmus Louis;Cox Henrikus Herman Marie;De Groot Antonius Franciscus Johannes;Vermeulen Johannes Petrus Martinus Bernardus |
分类号 |
G03F7/20;H01L21/68 |
主分类号 |
G03F7/20 |
代理机构 |
Pillsbury Winthrop Shaw Pittman LLP |
代理人 |
Pillsbury Winthrop Shaw Pittman LLP |
主权项 |
1. A positioning device for positioning an object within a lithographic apparatus, the positioning device comprising:
a support structure configured to support the object; at least two short-stroke units, each having a connection section connected to the support structure at a respective connection point; and a long-stroke unit; wherein each of the short-stroke units comprises a short-stroke actuator system configured to cooperate with a same surface of the long-stroke unit to provide independently an actuation force between the connection section of the short-stroke unit and the long-stroke unit so that a position of a first of the at least two short-stroke units is independently controlled relative to a position of a second of the at least two short-stroke units; and wherein the long-stroke unit comprises a long-stroke actuator system configured to provide an actuation force between the long-stroke unit and a reference structure of the lithographic apparatus. |
地址 |
Veldhoven NL |