发明名称 Abrasive slurry and dressing bar for embedding abrasive particles into substrates
摘要 An abrasive polishing slurry including abrasive particles in a carrier fluid and micro-nano members. A system and method for making an abrasive article using the polishing slurry is also disclosed. The system includes a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the members set a height the embedded abrasive particles protrude above the substrate.
申请公布号 US8944886(B2) 申请公布日期 2015.02.03
申请号 US201113289797 申请日期 2011.11.04
申请人 RDC Holdings, LLC 发明人 Schwappach Karl G.;Boutaghou Zine-Eddine
分类号 B24B1/00;B24D11/00 主分类号 B24B1/00
代理机构 代理人
主权项 1. A system for making an abrasive article comprising: abrasive particles in a carrier fluid; micro-nano scale members; a substrate; and a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the micro-nano scale members set a height the embedded abrasive particles protrude above the substrate.
地址 North Oaks MN US