发明名称 |
Abrasive slurry and dressing bar for embedding abrasive particles into substrates |
摘要 |
An abrasive polishing slurry including abrasive particles in a carrier fluid and micro-nano members. A system and method for making an abrasive article using the polishing slurry is also disclosed. The system includes a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the members set a height the embedded abrasive particles protrude above the substrate. |
申请公布号 |
US8944886(B2) |
申请公布日期 |
2015.02.03 |
申请号 |
US201113289797 |
申请日期 |
2011.11.04 |
申请人 |
RDC Holdings, LLC |
发明人 |
Schwappach Karl G.;Boutaghou Zine-Eddine |
分类号 |
B24B1/00;B24D11/00 |
主分类号 |
B24B1/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A system for making an abrasive article comprising:
abrasive particles in a carrier fluid; micro-nano scale members; a substrate; and a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the micro-nano scale members set a height the embedded abrasive particles protrude above the substrate. |
地址 |
North Oaks MN US |