| 发明名称 | Multiple anode ion source | ||
| 摘要 | An ion source is provided. The ion source comprises a first cylindrical anode and a second cylindrical anode. The first cylindrical anode is concentric with the second cylindrical anode. The ion source further comprises an electron source positioned within the first cylindrical anode or the second cylindrical anode. | ||
| 申请公布号 | US8946651(B2) | 申请公布日期 | 2015.02.03 |
| 申请号 | US201113192251 | 申请日期 | 2011.07.27 |
| 申请人 | Seagate Technology LLC | 发明人 | McLeod Paul Stephen;Chour Kueir-Weei |
| 分类号 | C23C14/04;H01J27/02;H01J27/26;G11B5/84 | 主分类号 | C23C14/04 |
| 代理机构 | Hall Estill Attorneys at Law | 代理人 | Hall Estill Attorneys at Law |
| 主权项 | 1. An ion source for ion beam deposition comprising: a first cylindrical anode having a first overall diameter; a second cylindrical anode having a second overall diameter greater than the first overall diameter, the first cylindrical anode being concentric with and axially offset from the second cylindrical anode along a common central axis so as to protrude closer to a substrate than the second cylindrical anode; and an electron source positioned within the first cylindrical anode or the second cylindrical anode. | ||
| 地址 | Scotts Valley CA US | ||