METHOD AND DEVICE FOR FABRICATING PROTECTIVE FILM FOR LIGHT EMITTING ELEMENT

摘要

Provided are a method and device for fabricating a protective film for a light emitting element to form a light emitting element with high brightness and superior reliability. Therefore, prior to carrying out film formation in a film forming chamber (50) in a device (10) for fabricating a protective film for a light emitting element, a sapphire substrate (W) is heated to a prescribed temperature or higher in a heating chamber (40A) and plasma is initiated in the film forming chamber (50) before the sapphire substrate (W) is conveyed thereto. The sapphire substrate (W) that has been heated to the prescribed temperature or higher is conveyed from the heating chamber (40A) to the film forming chamber (50), and the sapphire substrate (W) is subjected to a plasma treatment in the film forming chamber (50) to form the protective film.