摘要 |
<p>Disclosed is a material for forming a ruthenium film, which is easily decomposed in the absence of an oxidizing agent such as oxygen. Specifically disclosed is a material for forming a ruthenium film, which contains a compound represented by formula (1). Ru(PR1 3)l(L1)m(L2)n (1) (In formula (1), R1s each independently represents a hydrogen atom, a halogen atom, a hydrocarbon group having 1-4 carbon atoms or a halogenated hydrocarbon group having 1-4 carbon atoms; L1 represents a hydrogen atom or a halogen atom; L2 represents an unsaturated hydrocarbon compound having at least two double bonds and 4-10 carbon atoms; l represents an integer of 1-5; m represents an integer of 0-4; and n represents an integer of 0-2. In this connection, l + m + 2n is 5 or 6.)</p> |