| 摘要 |
<p>This invention provides a material for pattern formation, that has an I/O value and a glass transition temperature of a binder, contained in a photosensitive layer, which both fall within respective given numerical ranges and, by virtue of this constitution, has excellent resolution and tenting properties and, at the same time, has excellent developing properties and resist separability, and an apparatus for pattern formation comprising the material for pattern formation, and a method for pattern formation using the material for pattern formation. The material for pattern formation comprises at least a photosensitive layer provided on a support. The photosensitive layer comprises a binder, a polymerizable compound, and a photopolymerization initiator. The binder has an I/O value of 0.300 to 0.650 and an acid value of 130 to 250 (mg-KOH/g). Preferably, the binder comprises a copolymer, and the copolymer comprises not less than 30% by mass of a monomer constituting a homopolymer having an I/O value of not more than 0.35. There are also provided an apparatus for pattern formation comprising the material for pattern formation, and a method for pattern formation using the material for pattern formation.</p> |
