| 摘要 |
The present invention relates to a polymer comprising repeat units having an undermentioned structure. In the formula, R^1, R^2, Ar^1, Ar^2, and Ar^3 are as defined in the present specification. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists. |
