发明名称 CMOS IMAGE SENSORS AND METHOD FOR FORMING THE SAME
摘要 A device includes a diode, which includes a first, a second, and a third doped region in a semiconductor substrate. The first doped region is of a first conductivity type, and has a first impurity concentration. The second doped region is of the first conductivity type, and has a second impurity concentration lower than the first impurity concentration. The second doped region encircles the first doped region. The third doped region is of a second conductivity type opposite the first conductivity type, wherein the third doped region overlaps a portion of the first doped region and a portion of the second doped region.
申请公布号 KR101485653(B1) 申请公布日期 2015.01.22
申请号 KR20130007882 申请日期 2013.01.24
申请人 发明人
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
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