| 发明名称 |
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE |
| 摘要 |
Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan. |
| 申请公布号 |
US2015021292(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201414511065 |
申请日期 |
2014.10.09 |
| 申请人 |
Shin-Etsu Chemical Co., Ltd. |
发明人 |
HARADA Daijitsu;TAKEUCHI Masaki;SHIBANO Yukio;UEDA Shuhei;WATABE Atsushi |
| 分类号 |
C09G1/02;C03C19/00;C09K13/02;C03C15/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of polishing a synthetic quartz glass substrate by a polishing slurry comprising:
a colloidal solution in the form of a colloidal silica water dispersion; and at least one component selected from the group consisting of a carboxylic acid polymer, a phenol, and a glycosaminoglycan, said colloidal solution having a colloidal silica concentration of 20 to 50% by mass, and said polishing slurry having pH 9 to 10.5. |
| 地址 |
Tokyo JP |
