发明名称 |
MRAM SYNTHETIC ANITFEROMAGNET STRUCTURE |
摘要 |
An MRAM bit (10) includes a free magnetic region (15), a fixed magnetic region (17) comprising an antiferromagnetic material, and a tunneling barrier (16) comprising a dielectric layer positioned between the free magnetic region (15) and the fixed magnetic region (17). The MRAM bit (10) avoids a pinning layer by comprising a fixed magnetic region exhibiting a well-defined high Hflop using a combination of high Hk (uniaxial anisotropy), high Hsat (saturation field), and ideal soft magnetic properties exhibiting well-defined easy and hard axes. |
申请公布号 |
US2015021606(A1) |
申请公布日期 |
2015.01.22 |
申请号 |
US201414303200 |
申请日期 |
2014.06.12 |
申请人 |
Everspin Technologies, Inc. |
发明人 |
Pietambaram Srinivas V.;Akerman Bengt J.;Whig Renu;Janesky Jason;Rizzo Nicholas D.;Slaughter Jon |
分类号 |
H01L43/10;H01L43/02 |
主分类号 |
H01L43/10 |
代理机构 |
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代理人 |
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主权项 |
1. An MRAM cell comprising:
a free magnetic region; a fixed magnetic region consisting essentially of an unpinned, fixed synthetic antiferromagnetic (SAF) magnetic structure, wherein the unpinned, fixed SAF magnetic structure comprises:
a first layer of one or more ferromagnetic materials, wherein the one or more ferromagnetic materials includes cobalt,a second layer,a third layer of one or more ferromagnetic materials, anda first anti-ferromagnetic coupling layer, wherein:
the first anti-ferromagnetic coupling layer is disposed between the first and third layers, andthe second layer is disposed between the first layer and the first anti-ferromagnetic coupling layer; and a dielectric layer disposed between the free magnetic region and the unpinned, fixed SAF magnetic structure. |
地址 |
Chandler AZ US |