发明名称 MRAM SYNTHETIC ANITFEROMAGNET STRUCTURE
摘要 An MRAM bit (10) includes a free magnetic region (15), a fixed magnetic region (17) comprising an antiferromagnetic material, and a tunneling barrier (16) comprising a dielectric layer positioned between the free magnetic region (15) and the fixed magnetic region (17). The MRAM bit (10) avoids a pinning layer by comprising a fixed magnetic region exhibiting a well-defined high Hflop using a combination of high Hk (uniaxial anisotropy), high Hsat (saturation field), and ideal soft magnetic properties exhibiting well-defined easy and hard axes.
申请公布号 US2015021606(A1) 申请公布日期 2015.01.22
申请号 US201414303200 申请日期 2014.06.12
申请人 Everspin Technologies, Inc. 发明人 Pietambaram Srinivas V.;Akerman Bengt J.;Whig Renu;Janesky Jason;Rizzo Nicholas D.;Slaughter Jon
分类号 H01L43/10;H01L43/02 主分类号 H01L43/10
代理机构 代理人
主权项 1. An MRAM cell comprising: a free magnetic region; a fixed magnetic region consisting essentially of an unpinned, fixed synthetic antiferromagnetic (SAF) magnetic structure, wherein the unpinned, fixed SAF magnetic structure comprises: a first layer of one or more ferromagnetic materials, wherein the one or more ferromagnetic materials includes cobalt,a second layer,a third layer of one or more ferromagnetic materials, anda first anti-ferromagnetic coupling layer, wherein: the first anti-ferromagnetic coupling layer is disposed between the first and third layers, andthe second layer is disposed between the first layer and the first anti-ferromagnetic coupling layer; and a dielectric layer disposed between the free magnetic region and the unpinned, fixed SAF magnetic structure.
地址 Chandler AZ US