| 发明名称 |
PIEZOELECTRIC FILM PRODUCING PROCESS, VIBRATOR ELEMENT, VIBRATOR, OSCILLATOR, ELECTRONIC DEVICE, AND MOVING OBJECT |
| 摘要 |
A piezoelectric film producing process includes depositing a piezoelectric body in a mixed atmosphere of N2 gas and Ar gas by using a sputtering method, using an Al—Cu alloy as deposition material. |
| 申请公布号 |
US2015022274(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201414330626 |
申请日期 |
2014.07.14 |
| 申请人 |
SEIKO EPSON CORPORTION |
发明人 |
YAMAZAKI Takashi;IWAMOTO Osamu |
| 分类号 |
H01L41/09;C23C14/14;H01L41/107;H01L41/18;H03B5/32;C22C21/12;C23C14/34 |
主分类号 |
H01L41/09 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A piezoelectric film producing process comprising depositing a piezoelectric film in a mixed atmosphere of N2 gas and Ar gas by using a sputtering method, using an Al—Cu alloy as deposition material. |
| 地址 |
Tokyo JP |
