| 发明名称 |
UNEVENNESS INSPECTION APPARATUS AND UNEVENNESS INSPECTION METHOD |
| 摘要 |
An unevenness inspection apparatus including: an image pickup section obtaining a pickup image of a test object; an image generating section generating each of a color unevenness inspection image and a luminance unevenness inspection image based on the pickup image; a calculating section calculating an evaluation parameter using both of the color unevenness inspection image and the luminance unevenness inspection image; and an inspecting section performing unevenness inspection using the calculated evaluation parameter. The calculating section calculates the evaluation parameter in consideration of unevenness visibility for both color and luminance. |
| 申请公布号 |
US2015022672(A1) |
申请公布日期 |
2015.01.22 |
| 申请号 |
US201414511464 |
申请日期 |
2014.10.10 |
| 申请人 |
SONY CORPORATION |
发明人 |
NAGAMINE KUNIHIKO;TOMIOKA SATOSHI |
| 分类号 |
G01J3/50;G01J3/46;H04N17/02 |
主分类号 |
G01J3/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An unevenness inspection apparatus comprising:
an image pickup section obtaining a pickup image of a test object; an image generating section generating each of a color unevenness inspection image and a luminance unevenness inspection image based on the pickup image; a calculating section calculating an evaluation parameter using both of the color unevenness inspection image and the luminance unevenness inspection image; and an inspecting section performing unevenness inspection using the calculated evaluation parameter, wherein the calculating section calculates the evaluation parameter in consideration of unevenness visibility for both color and luminance. |
| 地址 |
Tokyo JP |
