| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor phase growth apparatus for stabilizing a supply amount of organic metal in a process gas, with a simple configuration.SOLUTION: A vapor phase growth apparatus according to an embodiment comprises: a reaction chamber; a gas supply path which is connected to an organic metal supply source through a first connection part, is connected to a carrier gas supply source, and supplies a process gas including organic metal and a carrier gas to the reaction chamber; a gas discharge path which is connected to the organic metal supply source through a second connection part, and discharges the process gas to the outside of the apparatus; a first mass flow controller provided on the carrier gas supply source side of the gas supply path; a first adjustment unit provided on the reaction chamber side of the gas supply path; a second adjustment unit provided on the outside of the apparatus of the gas discharge path; and a communication path for making the gas supply path communicate with the gas discharge path. Either of the first and second adjustment units is a back pressure regulator, and the other is a mass flow controller. |
