INLINE DEPOSITION CONTROL APPARATUS AND METHOD OF INLINE DEPOSITION CONTROL

摘要

An inline deposition control apparatus for a vacuum deposition apparatus having one or more deposition sources for depositing one or more deposition layers on a substrate, includes one or more light sources adapted to illuminate the substrate having the one or more deposition layers; a detection arrangement adapted for spectrally resolved detection of a measurement signal, wherein the measurement signal is selected from at least one of: light reflected at the substrate having the one or more deposition layers, and light transmitted through the substrate having the one or more deposition layers; an evaluation unit to determine the respective thicknesses of the one or more layers based on the measurement signal; and a controller connected to the evaluation unit and connectable to the deposition apparatus for feed-back control of the deposition of the one or more deposition layers based on the determined thicknesses. Furthermore, a method of inline deposition control is provided.

主权项

1. An inline deposition control apparatus for a vacuum deposition apparatus having one or more deposition sources for depositing one or more deposition layers on a substrate, comprising:
one or more light sources adapted to illuminate the substrate having the one or more deposition layers; a detection arrangement adapted for spectrally resolved detection of a measurement signal, wherein the measurement signal is selected from at least one of: light reflected at the substrate having the one or more deposition layers, and light transmitted through the substrate having the one or more deposition layers; an evaluation unit to determine the respective thicknesses of the one or more layers based on the measurement signal; and a controller connected to the evaluation unit and connectable to the deposition apparatus for feed-back control of the deposition of the one or more deposition layers based on the determined thicknesses.