Lithographic apparatus and method

摘要

A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

主权项

1. A method comprising
providing a beam of radiation using an illumination system; using a patterning device to impart the radiation beam with a pattern in its cross-section; and projecting the patterned radiation beam onto a target portion of a substrate; wherein the illumination system comprises an array of individually controllable elements and associated optical components arranged to convert the radiation beam into a desired illumination mode; and wherein an allocation scheme is used to allocate different individually controllable elements to different parts of the illumination mode, the allocation scheme being selected to provide a desired modification of one or more properties of the illumination mode or of the radiation beam in addition to or other than spatial or angular intensity distribution of the illumination mode.