| 摘要 |
<p>An illumination optical unit for projection lithography serves for illuminating an object field (3) with an illumination light (8) of a major light source (6). The illumination optical unit comprises raster batches (12, 16) in order to pre-limit the shape of the object field (3), a transfer optical unit (17) for overlapping transfer of the illumination light (8) toward the object field (3), and an illumination angle control device (14). The latter deflects the illumination light (8) at a different deflection angle. The illumination angle control device (14) has at least one illumination angle control unit (14b) capable of displacement in order to produce a deflection angle to the illumination light (8). The illumination angle control unit (14b) capable of displacement can be displaced to the raster batches (12, 16) for influencing the size of a second deflection angle, which is formed by the illumination angle control unit (14b) on the deflected plane (xz) perpendicular to the object deflection direction (y). Thereby, the illumination optical unit can influence the illumination intensity on the object field in a target method with an illumination-angle-depending method.</p> |
