发明名称 LOW VAPOR PRESSURE HIGH PURITY GAS DELIVERY SYSTEM
摘要 <p>Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the low vapor pressure fluid pressure falls below a specified value for the purpose of removing a first supply vessel from service by discontinuing vapor flow from the first supply vessel and initiating vapor flow from a second supply vessel.</p>
申请公布号 KR101484791(B1) 申请公布日期 2015.01.20
申请号 KR20097008668 申请日期 2007.09.27
申请人 发明人
分类号 F17C5/06;F17C7/04;F17C13/02 主分类号 F17C5/06
代理机构 代理人
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