发明名称 METHOD FOR MANUFACTURING PATTERNED ORGANIC SEMICONDUCTOR COMPOUND-CONTAINING LAYER
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for forming a patterned organic semiconductor compound-containing layer by a simple and convenient method at low cost without using a mask or a bank .SOLUTION: A method for manufacturing a patterned organic semiconductor compound-containing layer comprises a step of heating an organic layer including a precursor compound, which is converted to an organic semiconductor compound by heating, with a thermal head in a pattern shape.</p>
申请公布号 JP2015011903(A) 申请公布日期 2015.01.19
申请号 JP20130137376 申请日期 2013.06.28
申请人 KYUSHU UNIV;RICOH CO LTD 发明人 GOTO DAISUKE;MORI MASATAKA;MORIMOTO KYO;ADACHI CHIHAYA
分类号 H05B33/10;H01L51/50 主分类号 H05B33/10
代理机构 代理人
主权项
地址