CLEANING METHOD AND PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To effectively clean a processing device while using a gas supply mechanism capable of performing shunt control.SOLUTION: A cleaning method including a gas supply mechanism for cleaning a processing device is disclosed. The gas supply mechanism includes: a shunt control part; a first channel communicating to an upstream side of the shunt control part; a first valve provided in the first channel; a second channel communicating to a downstream side of the shunt control part; a second valve provided in the second channel; and a bypass valve provided in a detour channel connecting the first channel and the second channel and connected to the second channel. The cleaning method includes: a bypass opening step of closing the first valve and the second valve and opening the bypass valve; and a cleaning step of introducing gas from the detour channel to the processing device after the bypass opening step, and cleaning the processing device.