| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure machine stage of two-stage correction including an exposure stage, a substrate holder, a first stage correction device located between the exposure stage and a support base, and a second stage correction device located between the exposure stage and the substrate holder.SOLUTION: A correction device is installed not only between an exposure stage and a support base, but also between the exposure stage and a holder. When the amount to be corrected is small, it can be corrected directly by the correction device of the exposure stage. When the amount to be corrected is large, and cannot be corrected only by the stage, the remaining amount to be corrected is corrected by a second stage correction device located under the holder.</p> |
