| 摘要 |
<p>This deposition apparatus is provided with: an L/UL chamber; an H chamber which communicates with the L/UL chamber; an SP chamber which communicates with the H chamber and is divided into an independent first space and second space; film formation units positioned in the first space and the second space; evacuation devices, which are independently provided to the L/UL chamber, the H chamber, the first space and the second space, for evacuating the insides of the L/UL chamber, the H chamber, the first space and the second space; four lines comprising outbound paths and inbound paths positioned in the first space and the second space, said lines passing through the L/UL chamber and the H chamber; a carrier device for carrying an object to be processed along the outbound paths and inbound paths; and transfer mechanisms for transferring the carrier device from the outbound paths to the inbound paths, inside the first space and the second space.</p> |
