| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure equipment advantageous to improvement in overlay accuracy in a joint region when performing joint exposure.SOLUTION: The exposure equipment joints a first image with a second image to expose an image having an area larger than that of the first image or the second image to a pattern forming region PS10 on a substrate. Further, the exposure equipment has a control unit for allowing one or more alignment marks AM12, AM13 (AM21, AM22) in a scanning direction of the substrate to be formed in a joint region C in which a first pattern region MS1 for formation of the first image and a second pattern region MS2 for formation of the second image are overlapped with each other in the pattern forming region PS10, and allowing alignment in forming the next layer on the image by using the alignment marks AM12, AM13 (AM21, AM22). |
