| 摘要 |
Provided is a deposition mask to reduce deposition error. For examples, a deposition mask includes deposition pattern parts which are separated from each other in a first direction and includes pattern openings; dummy pattern parts which are arranged at both sides of each deposition pattern part in the first direction and include grooves; and fixing parts which are arranged in the outside of the outermost dummy pattern part among the dummy pattern part in the first direction. The maximum thickness of each dummy pattern part is greater than the maximum thickness of the deposition pattern part and is less than the maximum thickness of each fixing part. |
