发明名称 |
LASER PROCESSING APPARATUS, LASER IRRADIATION POINT CORRECTION METHOD, DRILLING PROCESSING METHOD, AND WIRING SUBSTRATE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a laser processing apparatus capable of improving correction accuracy.SOLUTION: A laser processing apparatus 10 comprises: a laser oscillator 12; galvanometer mirrors 14 and 15 scanning a laser beam L1 output from the laser oscillator 12; and a condensation lens 18 condensing the laser beams L1 output from the galvanometer mirrors 14 and 15. The laser processing apparatus 10 includes a table 20 that has a first region R1 in which a wiring substrate 30 to be drilled by the laser beam L1 output from the condensation lens 18 is mounted, and a second region R2 different from the first region R1. The laser processing apparatus 10 includes: a workpiece 40 mounted in the second region R2, and including the wiring substrate 30, a pattern 42 laminated on the substrate 30, and a film laminated on the substrate 30 so as to cover the pattern 42; and an imaging device 19 imaging the pattern 42. |
申请公布号 |
JP2015006674(A) |
申请公布日期 |
2015.01.15 |
申请号 |
JP20130131819 |
申请日期 |
2013.06.24 |
申请人 |
SHINKO ELECTRIC IND CO LTD |
发明人 |
MOCHIZUKI SEIKI |
分类号 |
B23K26/02;B23K26/00;B23K26/042;B23K26/082;B23K26/382;H05K3/00 |
主分类号 |
B23K26/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|