发明名称 METHOD AND SYSTEM TO REDUCE OUTGASSING IN A REACTION CHAMBER
摘要 Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
申请公布号 US2015017319(A1) 申请公布日期 2015.01.15
申请号 US201313941134 申请日期 2013.07.12
申请人 ASM IP Holding B.V. 发明人 Jung Sung-Hoon;Raisanen Petri;Liu Eric Jen Cheng;Schmotzer Mike
分类号 C23C16/44 主分类号 C23C16/44
代理机构 代理人
主权项 1. A method of reducing outgassing of a substance, the method comprising the steps of: providing a gas-phase reactor having a reaction chamber; forming a barrier layer on a surface of the reaction chamber to mitigate outgassing of one or more gasses; depositing material onto a surface of a substrate within the reaction chamber; and removing the substrate from the reaction chamber.
地址 Almere NL