发明名称 |
METHOD AND SYSTEM TO REDUCE OUTGASSING IN A REACTION CHAMBER |
摘要 |
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system. |
申请公布号 |
US2015017319(A1) |
申请公布日期 |
2015.01.15 |
申请号 |
US201313941134 |
申请日期 |
2013.07.12 |
申请人 |
ASM IP Holding B.V. |
发明人 |
Jung Sung-Hoon;Raisanen Petri;Liu Eric Jen Cheng;Schmotzer Mike |
分类号 |
C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
|
主权项 |
1. A method of reducing outgassing of a substance, the method comprising the steps of:
providing a gas-phase reactor having a reaction chamber; forming a barrier layer on a surface of the reaction chamber to mitigate outgassing of one or more gasses; depositing material onto a surface of a substrate within the reaction chamber; and removing the substrate from the reaction chamber. |
地址 |
Almere NL |