| 摘要 |
PROBLEM TO BE SOLVED: To obtain a vacuum device by which the pressure in a vacuum chamber is kept low without using a vacuum pump of high pumping speed even when a large amt. of heat is radiated from a heat source. SOLUTION: An evacuating system 2 provided with a turbo molecular pump is connected to a vacuum chamber 1. A heater 4 for heating a semiconductor substrate 3 and a thermocouple 5 for measuring the temp. of the substrate 3 are set in the chamber 1. A pure aluminum film 6 is formed on the inner wall of the chamber 1. Since the film 6 has >=95% reflectivity with respect to an IR of >=1.2μm in the vacuum device, the radiated heat is reflected by the film. Accordingly, even when a large amt. of heat is radiated from the energized heater 4, the vacuum chamber is not heated due to the film 6, and the release of gas is suppressed.
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