| 发明名称 |
METHOD OF FABRICATING SPUTTERING TARGET, SPUTTERING TARGET USING THE METHOD, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS USING THE SPUTTERING TARGET |
| 摘要 |
A method of fabricating a sputtering target includes preparing a first powder material including at least one of a tin oxide and a mesh-forming oxide; mixing the first powder material and a second powder material comprising carbon or a tin oxide to prepare a mixture; simultaneously performing a primary compression and primary sintering on the mixture in a reduction atmosphere; and simultaneously performing a secondary compression and secondary sintering on the mixture in the reduction atmosphere to prepare the sputtering target. |
| 申请公布号 |
US2015014151(A1) |
申请公布日期 |
2015.01.15 |
| 申请号 |
US201414205624 |
申请日期 |
2014.03.12 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
Shin Sang-Wook;Jung Sun-Young;Lee Il-Sang;Park Jin-Woo;Kim Dong-Jin |
| 分类号 |
C23C14/34;H01J37/34;C23C14/08 |
主分类号 |
C23C14/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of fabricating a sputtering target, the method comprising:
preparing a first powder material comprising at least one of a tin oxide and a mesh-forming oxide; mixing the first powder material and a second powder material to prepare a mixture, wherein the second powder material comprises carbon or a tin oxide; simultaneously performing a primary compression and a primary sintering on the mixture in a reduction atmosphere; and simultaneously performing a secondary compression and a secondary sintering on the mixture in the reduction atmosphere to prepare the sputtering target. |
| 地址 |
Yongin-City KR |
