发明名称 半導体装置
摘要 <p>It is an object to provide a semiconductor device with low wiring resistance, high transmittance, or a high aperture ratio. A gate electrode, a semiconductor layer, and a source electrode and a drain electrode are formed using a material having a light-transmitting property and a wiring such as a gate wiring or a source wiring is formed using a material whose resistivity is lower than that of the material having a light-transmitting property. Alternatively, the source wiring and/or the gate wiring are/is formed by a stack of a material having a light-transmitting property and a material whose resistivity is lower than that of the material having a light-transmitting property.</p>
申请公布号 JP5651350(B2) 申请公布日期 2015.01.14
申请号 JP20100048615 申请日期 2010.03.05
申请人 发明人
分类号 H01L29/786;G02F1/1368;G09F9/30;H01L21/3205;H01L21/768;H01L23/522;H01L23/532;H01L51/50;H05B33/14;H05B33/26;H05B33/28 主分类号 H01L29/786
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