发明名称 低底面転位バルク成長SiCウェハ
摘要 <p>A high quality single crystal wafer of SiC is disclosed. The wafer has a diameter of at least about 3 inches (75 mm) and at least one continuous square inch (6.25 cm<SUP>2</SUP>) of surface area that has a basal plane dislocation volume density of less than about 500 cm<SUP>-2 </SUP>for a 4 degree off-axis wafer.</p>
申请公布号 JP5653598(B2) 申请公布日期 2015.01.14
申请号 JP20090154425 申请日期 2009.06.29
申请人 发明人
分类号 C30B29/36;H01L21/20;H01L21/336;H01L21/338;H01L29/78;H01L29/812 主分类号 C30B29/36
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