| 主权项 |
1. A metering structure on a sample processing device, the sample processing device configured to be rotated about an axis of rotation, the metering structure comprising:
a metering reservoir configured to hold a selected volume of liquid, the metering reservoir including a first end and a second end positioned radially outwardly of the first end, relative to the axis of rotation; a waste reservoir positioned in fluid communication with the first end of the metering reservoir and configured to catch excess liquid from the metering reservoir when the selected volume of the metering reservoir is exceeded, wherein at least a portion of the waste reservoir is positioned radially outwardly of the metering reservoir, relative to the axis of rotation; and a capillary valve in fluid communication with the second end of the metering reservoir, wherein the capillary valve is positioned radially outwardly of at least a portion of the metering reservoir, relative to the axis of rotation, and is configured to inhibit liquid from exiting the metering reservoir until desired; a valve chamber in fluid communication with an outlet of the capillary valve; a process chamber positioned to be in fluid communication with an outlet of the valve chamber; and a valve septum located between the valve chamber and the process chamber, the valve septum having:
a closed configuration wherein the valve chamber and the process chamber are not in fluid communication, andan open configuration wherein the valve chamber and the process chamber are in fluid communication; wherein the valve chamber, the capillary valve, and the valve septum are configured such that the valve chamber provides a vapor lock when the valve septum is in the closed configuration. |
