| 摘要 |
FIELD: metallurgy.SUBSTANCE: metal plating method comprises the sputtering of a coating on a base by feeding of wire electrodes connected to the power supply, towards their intersection, heating and melting by discontinuous arc discharge initiated in a gap between the ends of the wire electrodes by contactless break-down of gas interval with high voltage, and sputtering of the obtained molten metal by a carrier gas jet. In intervals between arc discharge impulses the sounding of the gap between wire electrodes is performed by means of additional test electrical pulses; heating and melting of wire electrodes by arc discharge impulses are performed at the stabilised size of the gap between wire electrodes, and the lift gas jet, dispersing the metal melt, of carrier gas is stabilised by temperature, humidity and pressure. The gap between the wire electrodes is stabilised in view of parameters of preceding testing electrical impulses or by means of changing the parameters of arc discharge impulses at the fixed feed speed of wire electrodes, or by means of changing a feed speed of wire electrodes at the fixed parameters of arc discharge impulses.EFFECT: invention allows to improve the stability of sputtering process and to ensure high uniformity of thickness of applied coating.3 cl, 5 dwg |
