发明名称 Method for fabricating semiconductor laser device
摘要 A first intermediate body is fabricated on a semiconductor substrate. The first intermediate body includes a first lasing portion of a multi-layer stack and a metal adherent layer. A second intermediate body is fabricated on a support substrate. The second intermediate body includes a second lasing portion formed of a multi-layer stack to be less in size than the first lasing portion, and a groove formed adjacent thereto to form a metal adherent layer. Then, with waveguide paths brought into close proximity, the adherent layers of the first and second intermediate bodies are fused to generate an integrated adherent layer, thereby securely adhering the first and second lasing portions to each other. Thereafter, the support substrate is stripped off from the second lasing portion, thereby allowing the adherent layer to be partially exposed. A semiconductor laser device is thus fabricated which has the exposed adherent layer as a common electrode.
申请公布号 US2007099321(A1) 申请公布日期 2007.05.03
申请号 US20040581202 申请日期 2004.09.27
申请人 MIYACHI MAMORU;KIMURA YOSHINORI;CHIKUMA KIYOFUMI 发明人 MIYACHI MAMORU;KIMURA YOSHINORI;CHIKUMA KIYOFUMI
分类号 H01L21/00;H01L21/28;H01L21/3205;H01S5/02;H01S5/042;H01S5/22;H01S5/40 主分类号 H01L21/00
代理机构 代理人
主权项
地址