发明名称 |
Sidewall diode driving device and memory using same |
摘要 |
A memory device includes a first conductor, a diode, a memory element, and a second conductor arranged in series. The diode includes a first semiconductor layer over and in electrical communication with the first conductor. A patterned insulating layer has a sidewall over the first semiconductor layer. The diode includes an intermediate semiconductor layer on a first portion of the sidewall, and in contact with the first semiconductor layer. The intermediate semiconductor layer has a lower carrier concentration than the first semiconductor layer, and can include an intrinsic semiconductor. A second semiconductor layer on a second portion of the sidewall, and in contact with the intermediate semiconductor layer, has a higher carrier concentration than the intermediate semiconductor layer. A memory element is electrically coupled to the second semiconductor layer. The second conductor is electrically coupled to the memory element. |
申请公布号 |
US8927957(B2) |
申请公布日期 |
2015.01.06 |
申请号 |
US201213570660 |
申请日期 |
2012.08.09 |
申请人 |
Macronix International Co., Ltd. |
发明人 |
Lung Hsiang-Lan |
分类号 |
H01L29/18;H01L45/00 |
主分类号 |
H01L29/18 |
代理机构 |
Haynes Beffel & Wolfeld LLP |
代理人 |
Wu Yiding;Haynes Beffel & Wolfeld LLP |
主权项 |
1. A memory device, comprising:
a plurality of first access lines, the first access lines including a first semiconductor layer; a patterned insulating layer on the plurality of first access lines, including a plurality of trenches having first and second sidewalls, extending through the patterned insulating layer to the first semiconductor layer; first and second sidewall semiconductor layers including P-N junctions on the first and second sidewalls of each trench in the plurality of trenches; first and second memory elements in electrical communication with the first and second sidewall semiconductor layers in each trench in the plurality of trenches; and a plurality of second access lines, in electrical communication with the memory elements. |
地址 |
Hsinchu TW |