Method of manufacturing a wire grid polarizer

摘要

A dielectric layer 2 is formed on a region including grid-shaped convex portions 1a of a resin substrate 1 having the grid-shaped convex portions 1a with pitches of 80 nm to 120 nm on its surface, and metal wires 3 are formed on the dielectric layer 2. It is thereby possible to obtain a wire grid polarizer having a microstructural concavo-convex grid with pitches of the level of 120 nm or less that has not been implemented.

主权项

1. A method of manufacturing a wire grid polarizer, comprising the steps of:
forming a dielectric layer on a region including grid-shaped convex portions of a resin substrate having grid-shaped convex portions and concave portions on a surface thereof; and forming metal wires on one side faces of the convex portions of the dielectric layer by using oblique vapor deposition from one side face of the convex portions in which the metal wires are formed by depositing metal in the direction of an about 30° or less angle formed between the normal of the plane of the substrate and a source of vapor deposition within a plane perpendicularly intersecting a longitudinal direction of a grid of the grid-shaped convex portions, wherein the grid-shaped convex portions of the resin substrate have pitches 150 nm or less and a height 0.5 time to 2.0 times the pitches of the grid-shaped convex portions and the aspect ratio (a ratio being the ratio of the height (H3) to the width (w3), of the metal wires ranges from 2 to 5.