APPARATUS FOR TREATING SUBSTRATE

摘要

The present invention includes an apparatus and method for depositing a thin film on a substrate on which a mask is attached. An apparatus for processing a substrate includes an alignment module which aligns and bonds the mask on the substrate, a deposition module which deposits the thin film on the substrate, and a transfer module which includes a transfer robot which transfers the substrate between the processing module and the alignment module. The present invention minimizes the contamination of an alignment processing device due to a processing gas used in a deposition process by performing an alignment process and the deposition process in different devices.