Controlling Ion Energy Within A Plasma Chamber

摘要

Systems and methods controlling ion energy within a plasma chamber are described. One of the systems includes an upper electrode coupled to a sinusoidal RF generator for receiving a sinusoidal signal and a nonsinusoidal RF generator for generating a nonsinusoidal signal. The system further includes a power amplifier coupled to the nonsinusoidal RF generator. The power amplifier is used for amplifying the nonsinusoidal signal to generate an amplified signal. The system includes a filter coupled to the power amplifier. The filter is used for filtering the amplified signal using a filtering signal to generate a filtered signal. The system includes a chuck coupled to the filter. The chuck faces at least a portion of the upper electrode and includes a lower electrode. The lower electrode is used for receiving the filtered signal to facilitate achieving ion energy at the chuck to be between a lower threshold and an upper threshold.

主权项

1. A system for controlling ion energy within a plasma chamber, comprising:
a sinusoidal radio frequency (RF) generator for generating a sinusoidal signal; an upper electrode coupled to the sinusoidal RF generator for receiving the sinusoidal signal; a nonsinusoidal RF generator for generating a nonsinusoidal signal; a power amplifier coupled to the nonsinusoidal RF generator, the power amplifier for amplifying the nonsinusoidal signal to generate an amplified signal; a filter coupled to the power amplifier, the filter for filtering the amplified signal using a filtering signal to generate a filtered signal; and a chuck coupled to the filter, the chuck facing at least a portion of the upper electrode, the chuck including a lower electrode, the lower electrode for receiving the filtered signal to facilitate achieving ion energy at the chuck to be between a lower threshold and an upper threshold.