| 摘要 |
The present invention relates to the use, as a precursor for the chemical vapour deposition of PtSi at the surface of a support, of at least one organometallic complex of Pt comprising at least:—a ligand having a cyclic structure that comprises at least two non-adjacent C═C double bonds, or two ligands having a cyclic structure that each comprise a C═C double bond; and—a ligand chosen from *O—Si(R)3 and *N—(Si(R)3)2, with: the R units being chosen, independently of one another, from (C1-C4)alkoxy groups; the R′ units being chosen, independently of one another, from (C1-C4)alkyl and (C3-C4)cycloalkyl groups; and * representing the coordination of the ligand to the platinum. |
