发明名称 |
CALCULATED ELECTRICAL PERFORMANCE METRICS FOR PROCESS MONITORING AND YIELD MANAGEMENT |
摘要 |
<p>Methods and systems of process control and yield management for semiconductor device manufacturing based on predictions of final device performance are presented herein. Estimated device performance metric values are calculated based on one or more device performance models that link parameter values capable of measurement during process to final device performance metrics. In some examples, an estimated value of a device performance metric is based on at least one structural characteristic and at least one band structure characteristic of an unfinished, multi-layer wafer. In some examples, a prediction of whether a device under process will fail a final device performance test is based on the difference between an estimated value of a final device performance metric and a specified value. In some examples, an adjustment in one or more subsequent process steps is determined based at least in part on the difference.</p> |
申请公布号 |
WO2014210194(A1) |
申请公布日期 |
2014.12.31 |
申请号 |
WO2014US44148 |
申请日期 |
2014.06.25 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
GAO, XIANG;FLANNER, PHILIP;POSLAVSKY, LEONID;DI, MING;ZHAO, QIANG;PENNER, SCOTT |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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地址 |
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