| 摘要 |
<p>THE PRESENT INVENTION PROVIDES A COMPOSITION FOR FORMING A TOP ANTI-REFLECTION COATING HAVING A LOW REFRACTIVE INDEX, REALIZING A GRADUAL SWING CURVE AND GIVING A SMALL SWING RATIO. THIS COMPOSITION COMPRISES A SOLVENT AND AN ANTHRACENE SKELETON-CONTAINING POLYMER HAVING A HYDROPHILIC GROUP. THE COMPOSITION FORMS AN ANTI-REFLECTION COATING ON A PHOTORESIST FILM, AND CAN BE USED IN A PHOTOLITHOGRAPHIC PROCESS FOR FORMING A PATTERN BY USE OF LIGHT HAVING A WAVELENGTH OF 160 TO 260 NM.</p> |
