| 摘要 |
This invention provides the following: a photosensitive resin composition that has a low relative permittivity and exhibits good chemical resistance when made into a cured film; a cured-film manufacturing method; a cured film; a liquid-crystal display; and an organic EL display. Said photosensitive resin composition contains the component (S) described below, a photoacid generator, a solvent, and a polymer component containing the following: a polymer that has both a constitutional unit that has a group in which an acid group is protected by an acid-labile group and a constitutional unit that has a cross-linkable group; and/or both a polymer that has a constitutional unit that has a group in which an acid group is protected by an acid-labile group and a polymer that has a constitutional unit that has a cross-linkable group. The abovementioned component (S) is a compound that: has a linear or branched C6-20 aliphatic hydrocarbon group (that may have one or more groups selected from among -O-, -S-, cyclic alkylene groups, and arylene groups, but if two or more groups selected from among -O-, -S-, cyclic alkylene groups, and arylene groups are present, said two or more groups must not be adjacent); has one or more groups selected from among either alkoxysilane groups, blocked isocyanate groups, blocked isothiocyanate groups, blocked ketene groups, isocyanate groups, isothiocyanate groups, thiol groups, and oxazoline groups or ester groups, thioether groups, disulfide groups, amide groups, and urethane groups; has no carboxyl groups or alcoholic hydroxyl groups; and does not generate any carboxyl groups or alcoholic hydroxyl groups even upon reacting with the acid group(s) in the abovementioned polymer component. |
