发明名称 Tilt-imaging scanning electron microscope
摘要 One embodiment relates to a tilt-imaging scanning electron microscope apparatus. The apparatus includes an electron gun, first and second deflectors, an objective electron lens, and a secondary electron detector. The first deflector deflects the electron beam away from the optical axis, and the second deflector deflects the electron beam back towards the optical axis. The objective lens focuses the electron beam onto a spot on a surface of a target substrate, wherein the electron beam lands on the surface at a tilt angle. Another embodiment relates to a method of imaging a surface of a target substrate using an electron beam with a trajectory tilted relative to a substrate surface. Other embodiments and features are also disclosed.
申请公布号 US8921782(B2) 申请公布日期 2014.12.30
申请号 US201313846548 申请日期 2013.03.18
申请人 KLA-Tencor Corporation 发明人 Jiang Xinrong;Honjo Ichiro;Sears Christopher Malcolm Stanley;Han Liqun
分类号 H01J37/28;H01J37/26 主分类号 H01J37/28
代理机构 Okamoto & Benedicto LLP 代理人 Okamoto & Benedicto LLP
主权项 1. A tilt-imaging scanning electron microscope apparatus, the apparatus comprising: an electron gun for generating an electron beam along an optical axis of an electron beam column, wherein the electron beam includes a source-energy dispersion; a first deflector for deflecting the electron beam away from the optical axis; a second deflector for deflecting the electron beam back towards the optical axis, wherein the second deflector is configured such that a crossover of slow and fast electrons in the electron beam is formed at a position off the optical axis between the second deflector and the objective lens; an objective electron lens configured to image the crossover onto a spot displaced from the optical axis on a surface of a target substrate so as to generate secondary electrons, wherein the electron beam lands on the surface at a tilt angle; and a detector for detecting the secondary electrons.
地址 Milpitas CA US