发明名称 Detector, imprint apparatus, and article manufacturing method
摘要 A detector includes an illumination optical system that illuminates a first diffraction grating having a period in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period in the second direction different from the period of the first diffraction grating in the second direction. A detection optical system detects diffracted light diffracted by the first diffraction grating and the second diffraction grating. The detection optical system includes a photoelectric conversion element and a guide portion arranged on a pupil plane of the detection optical system. The guide portion guides, to the photoelectric conversion element, the light diffracted by the first diffracting grating and the second diffraction grating. The diffracted light diffracted by the second diffraction grating enters a position different from the guide portion on the pupil plane of the detection optical system.
申请公布号 US8922786(B2) 申请公布日期 2014.12.30
申请号 US201213653434 申请日期 2012.10.17
申请人 Canon Kabushiki Kaisha 发明人 Iwai Toshiki;Mishima Kazuhiko;Maeda Hironori;Minoda Ken
分类号 G01B11/02;G01D5/38;G03F7/00;G01D5/347 主分类号 G01B11/02
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A detector comprising: an illumination optical system configured to illuminate a first grating having a period in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period in the second direction different from the period of the first diffraction grating in the second direction; and a detection optical system configured to detect diffracted light diffracted by the first diffracted grating and the second diffraction grating illuminated by said illumination optical system, said detection optical system including a photoelectric conversion element and a guide portion arranged on a pupil plane of said detection optical system, wherein said illumination optical system forms a first pole and a second pole on a pupil plane thereof, the guide portion is configured to guide, to the photoelectric conversion element, the light diffracted by the first diffracting grafting and the second diffraction grating by illuminating the first diffraction grating and the second diffraction grating with the light from the first pole at an oblique incidence in the first detection, and the diffracted light diffracted by the second diffraction grating by illuminating the first diffracting grating and the second diffracting grating with the light from the second pole at an oblique incidence in the second direction enters a position different from the guide portion on the pupil plane of the detection optical system.
地址 Tokyo JP