DEVICE FOR SEPARATING EXHAUST EMISSION DISCHARGED FROM CVD REACTOR FOR PREPARATION OF POLYSILICON AND METHOD FOR SEPARATING EXHAUST EMISSION USING THE SAME

摘要

The present invention relates to an exhaust gas separating device and an exhaust gas separating method using the exhaust gas separating device characterized by including a first distillation tower for separating hydrogen gas from exhaust gas discharged from a chemical vapor deposition reactor for manufacturing polysilicon; a second distillation tower for separating hydrogen chloride gas from a downstream of the first distillation tower; a separator for separating a downstream of the second distillation tower into a gas phase stream and a liquid phase steam; and a third distillation tower for separating the gas phase stream of the separator into tetrachlorosilane and a mixture of trichlorosilane and dichlorosilane, wherein the liquid phase steam discharged from the separator is supplied to the first distillation tower.