发明名称 NITRIDE-BASED TRANSISTOR WITH VERTICAL CHANNEL AND METHOD OF FABRICATING THE SAME
摘要 <p>A nitride based transistor according to an embodiment of the present invention includes a first nitride based first semiconductor layer doped in a first type; a first nitride based second semiconductor layer doped in a second type and disposed on the first semiconductor layer; a first nitride based third semiconductor layer doped in the first type and disposed on the second semiconductor layer; a second nitride based fourth semiconductor layer disposed along an inside wall of a trench formed to pass through at least the second and third semiconductor layers and disposed on the third semiconductor layer outside the trench; and a gage electrode formed on the fourth semiconductor layer. The second nitride based fourth semiconductor layer includes nitride having an energy band gap different from those of the first to third semiconductor layers based on first nitride.</p>
申请公布号 KR20140146849(A) 申请公布日期 2014.12.29
申请号 KR20130069677 申请日期 2013.06.18
申请人 SEOUL SEMICONDUCTOR CO., LTD. 发明人 JEONG, YOUNG DO;KWAK, JUNE SIK
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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