| 摘要 |
<p>The present invention relates to an etching liquid composition and an etching method using the etching liquid composition and, more specifically, to an etching liquid composition for summarily etching stacked films and the etching method using the etching liquid composition. The present invention is to provide the etching liquid composition capable of obtaining the desired width of a thin wire and also obtaining the thin wire of a preferable cross-sectional shape for summarily etching the stacked film including a titanate type pellicle and a copper group pellicle, and the etching method using the same.</p> |
