发明名称 SCHOTTKY BARRIER DIODE AND PROCESS OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a Schottky barrier diode having a significantly reduced leak current, having an improved breakdown voltage, excellent in breakdown characteristics.SOLUTION: The Schottky barrier diode includes: an epitaxial growth layer having a mesa part formed on a substrate; and a Schottky electrode formed on the mesa part. A distance between an end part of the Schottky electrode and an upper surface end part of the mesa part is 2 μm or less. A distance x is 2 μm or less.
申请公布号 JP2014241436(A) 申请公布日期 2014.12.25
申请号 JP20140166682 申请日期 2014.08.19
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MIYAZAKI TOMIHITO;KIYAMA MAKOTO
分类号 H01L29/872;H01L21/329;H01L29/06;H01L29/47 主分类号 H01L29/872
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