发明名称 |
SCHOTTKY BARRIER DIODE AND PROCESS OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a Schottky barrier diode having a significantly reduced leak current, having an improved breakdown voltage, excellent in breakdown characteristics.SOLUTION: The Schottky barrier diode includes: an epitaxial growth layer having a mesa part formed on a substrate; and a Schottky electrode formed on the mesa part. A distance between an end part of the Schottky electrode and an upper surface end part of the mesa part is 2 μm or less. A distance x is 2 μm or less. |
申请公布号 |
JP2014241436(A) |
申请公布日期 |
2014.12.25 |
申请号 |
JP20140166682 |
申请日期 |
2014.08.19 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
MIYAZAKI TOMIHITO;KIYAMA MAKOTO |
分类号 |
H01L29/872;H01L21/329;H01L29/06;H01L29/47 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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