FUSED SILICA GLASS ARTICLE HAVING IMPROVED RESISTANCE TO LASER DAMAGE

摘要

A fused silica glass article having greater resistance to damage induced by exposure to laser radiation such as laser induced wavefront distortion at deep ultraviolet (DUV) wavelengths, and behaviors such as fluence dependent transmission, which are related to intrinsic defects in the glass. The improved resistance to laser damage may be achieved in some embodiments by loading the glass article with molecular hydrogen (H2) at temperatures of about 400° C. or less, or 350° C. or less. The combined OH and deuteroxyl (OD) concentration may be less than 10 ppm by weight. In other embodiments, the improved resistance may be achieved by providing the glass with 10 to 60 ppm deuteroxyl (OD) species by weight. In still other embodiments, improved resistance to such laser damage may be achieved by both loading the glass article with molecular hydrogen at temperatures of about 350° C. or less and providing the glass with less than 10 ppm combined OH and OD, or 10 to 60 ppm OD by weight.

主权项

1. A method of treating a fused silica glass article comprising:
providing a fused silica glass article, said fused silica glass article including a combined concentration of OH and OD groups of less than or equal to 60 ppm, said fused silica glass article being free of chlorine and fluorine; and heating said fused silica glass article in a gas atmosphere, said gas atmosphere comprising H2, said heating occurring at a temperature less than or equal to 400° C., said heating inducing transfer of H2 into said fused silica glass article to form a H2-loaded fused silica glass article, said H2-loaded fused silica glass article containing a minimum concentration of H2 of at least 1×1016 H2 molecules/cm3 throughout said H2-loaded fused silica glass article