发明名称 |
SOLDERING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
Provided is a soldering method through nickel plating layer to reduce void occurrence rate and a method of manufacturing semiconductor device by using the soldering method. By heating a copper base plate having a nickel plating layer at a temperature range of 300° C. to 400° C. in an inert gas atmosphere beforehand, void occurrence rate can be reduced in soldering the copper base plate to an insulating circuit board. |
申请公布号 |
US2014374470(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201414301425 |
申请日期 |
2014.06.11 |
申请人 |
FUJI ELECTRIC CO., LTD. |
发明人 |
ISO Akira |
分类号 |
B23K35/38;H01L23/00 |
主分类号 |
B23K35/38 |
代理机构 |
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代理人 |
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主权项 |
1. A soldering method comprising:
heating a member having a nickel plating layer in a temperature range of 300° C. to 400° C. in an inert gas atmosphere, and reducing a nickel oxide film on a surface of the nickel plating layer; and joining the member to a joined member with solder in a reducing gas atmosphere. |
地址 |
Kawasaki-shi JP |